Phase stabilization of Al:HfO2 grown on In(x)Ga(1-x)As substrates (x = 0, 0.15, 0.53) via trimethylaluminum-based atomic layer deposition
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| Description | scientific article published on 21 February 2014 |
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author: Elena Cianci Claudia Wiemer Alessio Lamperti Marco Fanciulli Sabina Spiga Alessandro Molle |
| Publication date | February 21, 2014 |
| Language | English |
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