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Nucleation and Atomic Layer Reaction in Nickel Silicide for Defect-Engineered Si Nanochannels

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Description scientific article published on June 3, 2013
Author/s

author: Andriy Gusak  Shadi A Dayeh  Jianyu Huang  Wei Tang 

Publication date June 3, 2013
Language English
Country of origin
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https://pubs.acs.org/doi/pdf/10.1021/nl400949n

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