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Photolysis of CF3CH2CHO in the presence of O2 at 248 and 266 nm: quantum yields, products, and mechanism.
scientific article published on 3 October 2013
Author/s
author: Jose Albaladejo, Christa Fittschen, María Antiñolo, Pascal Dréan, Elena Jiménez
Work details
Publication date
October 3, 2013
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Language
English
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