Thermal stability of precursors for atomic layer deposition of TiO2, ZrO2, and HfO2: an ab initio study of alpha-hydrogen abstraction in bis-cyclopentadienyl dimethyl complexes.
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| Description | scientific article published in February 2010 |
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author: Simon D. Elliott |
| Publication date | February 1, 2010 |
| Language | English |
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