Role of trimethylboron to silane ratio on the properties of p-type nanocrystalline silicon thin film deposited by radio frequency plasma enhanced chemical vapour deposition.
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| Description | scientific article published in April 2010 |
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author: Elvira Fortunato Hugo Águas Iwona Bernacka-Wojcik Sergej Filonovich Rodrigo Martins |
| Publication date | April 1, 2010 |
| Language | English |
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