Atomic layer deposition of a high-k dielectric on MoS2 using trimethylaluminum and ozone
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| Description | scientific article published on 21 July 2014 |
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author: Angelica Azcatl Xiaoye Qin Lanxia Cheng Robert M Wallace Kyeongjae Cho |
| Publication date | July 21, 2014 |
| Language | English |
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