Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
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| Description | scientific article published on January 1, 2011 |
| Author/s |
author: Tae Hee Han |
| Publication date | January 1, 2011 |
| Language | English |
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| Access work |
http://www.ingentaconnect.com/content/asp/jnn/2011/00000011/00000001/art00121 |
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| Missing/wrong data? | Edit Wikidata item |