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A look underneath the SiO2/4H-SiC interface after N2O thermal treatments

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Description scientific article published on April 8, 2013
Author/s

author: Fabrizio Roccaforte  Filippo Giannazzo  Patrick Fiorenza 

Publication date April 8, 2013
Language English
Country of origin
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https://www.beilstein-journals.org/bjnano/content/pdf/2190-4286-4-26.pdf

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