HF-(NH₄)₂S₂O₈-HCl Mixtures for HNO₃- and NOx-free Etching of Diamond Wire- and SiC-Slurry-Sawn Silicon Wafers: Reactivity Studies, Surface Chemistry, and Unexpected Pyramidal Surface Morphologies
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| Description | scientific article published on 15 April 2015 |
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author: André Stapf |
| Publication date | April 15, 2015 |
| Language | English |
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