Thermal probe maskless lithography for 27.5 nm half-pitch Si technology.
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| Description | scientific article |
| Author/s |
author: Felix Holzner Urs Duerig Armin W Knoll Michel Despont Daniel J Coady |
| Publication date | August 23, 2013 |
| Language | English |
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| Missing/wrong data? | Edit Wikidata item |