Focused laser spike (FLaSk) annealing of photoactivated chemically amplified resists for rapid hierarchical patterning
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| Description | scientific article published on April 18, 2011 |
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| Publication date | April 18, 2011 |
| Language | English |
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http://pubs.rsc.org/en/content/articlepdf/2011/NR/C1NR10050E |
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| Missing/wrong data? | Edit Wikidata item |