Role of interstitial voids in oxides on formation and stabilization of reactive radicals: interstitial HO2 radicals in F2-laser-irradiated amorphous SiO2.
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| Description | scientific article published in April 2006 |
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author: Masahiro Hirano Koichi Kajihara Linards Skuja Hideo Hosono |
| Publication date | April 1, 2006 |
| Language | English |
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