Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B(CH3)3
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| Description | scientific article (publication date: August 2012) |
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author: Elvira Fortunato Hugo Águas António Vicente Sergej Filonovich Andreia Araújo Tito Busani Joaquim P. Leitão Rodrigo Martins Diana Gaspar Márcia Vilarigues |
| Publication date | August 2012 |
| Language | English |
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