Deposition and simultaneous etching of Si in the chemical vapor deposition (CVD) process: approach by the charged cluster model
| Image |  |
|---|---|
| Description | scholarly article |
| Author/s |
author: Nong-Moon Hwang |
| Publication date | August 1999 |
| Language | English |
| Country of origin | |
| Wikipedia link | |
| Access work |
https://linkinghub.elsevier.com/retrieve/pii/S002202489900247X |
| Copyright status | |
| Missing/wrong data? | Edit Wikidata item |