Analytical TEM characterization of the interfacial layer between ALD HfO2 film and silicon substrate
| Image |  |
|---|---|
| Description | scientific article published in January 2005 |
| Author/s |
author: Jonas Sundqvist Kaupo Kukli |
| Publication date | January 2005 |
| Language | |
| Country of origin | |
| Wikipedia link | |
| Copyright status | |
| Missing/wrong data? | Edit Wikidata item |