Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
| Image |  |
|---|---|
| Description | scientific article |
| Author/s |
author: J. Ruud van Ommen Timo Sajavaara |
| Publication date | July 2019 |
| Language | |
| Country of origin | |
| Wikipedia link | |
| Copyright status | |
| Missing/wrong data? | Edit Wikidata item |