Atomic Layer Deposition of Localized Boron- and Hydrogen-Doped Aluminum Oxide Using Trimethyl Borate as a Dopant Precursor
| Image |  |
|---|---|
| Description | scientific article |
| Author/s |
author: Timo Sajavaara Mikko Nisula Felix Mattelaer Simon D. Elliott Jolien Dendooven Matthias M Minjauw |
| Publication date | April 23, 2020 |
| Language | |
| Country of origin | |
| Wikipedia link | |
| Copyright status | |
| Missing/wrong data? | Edit Wikidata item |