Mechanistic Role of H2O and the Ligand in the Chemical Vapor Deposition of Cu, Cu2O, CuO, and Cu3N from Bis(1,1,1,5,5,5-hexafluoropentane-2,4-dionato)copper(II)
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author: David V. Baxter Jiri Pinkas |
| Publication date | August 1, 1995 |
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